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 >제품소개>Power Supply>DC/Pulse |
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| 사용 |
| EnerStream, EnerPulse, EnerPulse Duo, PulseGen, PulseGen Duo series는 스퍼터 Application에 최적화된 부하에 맞도록 설계된 전원장치로 파형에 따라 DC 및 펄스 전원으로 나누어지며, 캐소드의 응용에 따라 Single Magnetron 과 Dual Magnetron 스퍼터로 구분된다.
대용량 DC전원은 EnerStream 모델의 병렬운전으로 DC 160kW 까지 공급이 가능하다. |
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| DC Magnetron Sputter : EnerStream series |
-Application : Al, Cu, Ti, Cr, Ni, Si, ITO
-Economic model. Applied to low resistive materials such as metal deposition process
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| Pulsed DC Magnetron Sputter : EnerPulse & PulseGen series |
-Application : Al, Cu, Ti, Cr, Ni, Si, ITO, Graphite, TiN,
-High resistive materials can be used such as silicon deposition process
High quality of thin film is enabled
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| Dual Magnetron Sputter : EnerPulse & PulsGen Duo series |
-Coating Application : Al, Cu, Ti, Cr, Ni, Si, ITO, Graphite, TiN
-High resistive materials can be used such as silicon deposition process
-Two different targets can be sputtered with one plasma power supply
-We enable the precise control of critical variables to vary the composition and other characteristics of thin film
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| 정격사항 |
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| Model |
Power |
Specifications |
Type |
Remarks |
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| PulseGen 20 |
20 kW |
800V / 50A (20~100kHz) |
Pulse |
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| PulseGen 40 |
40 kW |
800V / 100A (50~80kHz) |
Pulse |
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| * TBD (To be developed) |
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